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Special tutorial
"Introduction to High-power Impulse Magnetron Sputtering"


Prof. Daniel Lundin,

Linköping University, Sweden


Prof. Daniel Lundin obtained his Ph.D. in 2010 at Linköping University. After having worked at the Royal Institute of Technology (KTH), Sweden, Kiel University, Germany, and the National Center for Scientific Research (CNRS)/Paris-Saclay University, France, he returned to Sweden and currently hold the position of Associate Professor in the Coatings & Plasma Physics Division at Linköping University.

Throughout his entire career, he has been at the forefront of international research efforts on developing and characterizing new plasma-based methods for synthesizing thin films, in particular High Power Impulse Magnetron Sputtering (HiPIMS). In 2008 his research on the HiPIMS process was awarded the Institute of Physics Prize for novelty, significance and potential impact on future research. In 2009 he was ranked as one of Sweden’s young ‘Supertalents’ by the Swedish business journal Veckans Affärer. He is one of the editors on the first book on HiPIMS, published in 2020.   

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Date & Time

July 2, 13:00- 17:00 JST

Who should attend? 

Scientists, engineers, technicians and students who use or plan to use HiPIMS for materials modification and thin film deposition.


This is an introductory lecture on thin film deposition using high-power impulse magnetron sputtering (HiPIMS), and how this sputtering technique differs from conventional magnetron processes. 

The tutorial includes a brief introduction to the fundamentals of thin film growth as well as basic plasma physics, with emphasis on the role and characteristics of the plasma. Experimental results and simulations, based on industrially relevant material systems, will be used to illustrate mechanisms controlling nucleation kinetics, column formation, and microstructure evolution. Ionization of sputtered atoms will be discussed in detail for various target materials, since it enables effective surface modification via ion etching and self-ion-bombardment assistance during film growth, as well as being a key feature in HiPIMS. In addition, the role of self-sputtering, secondary electron emission, and the importance of controlling the process gas dynamics (both inert as well as reactive gases) will be examined in detail with the aim to generate stable HiPIMS processes.

The tutorial will also give an overview on how to characterize the HiPIMS discharge to establish general trends on how to optimize any given HiPIMS process. Such process optimization will also allow you to identify what external parameters to adjust for controlling film growth and thereby tune film properties, including hardness, homogeneity and residual stress.

Registration fee

Regular (Attendee of Scientific Sessions)              ¥5,000  
Regular (Only tutorial)                                             ¥20,000 

Student                                                                     ¥5,000 

How to register? 

You can register together with Conference registration through the following online registration system. Registration "only for tutorial course" is also available.

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